Fluorine-free UV-assisted etching of multi-layer Mo2C

Details

Product Information:

Name: UV-Assisted Etching Multi-layer Mo2CTx

Size: 1-5um

Number of layers :10-20 layers

Product performance: high purity and excellent electrochemical performance

Functional group: -OH-F-O-Cl (customizable)

Purity: 70-85wt%

Storage condition: Dry at room temperature

Process: Freeze dry

Details: A new UV-assisted selective etching method can etse the Ga atoms in the Mo2Ga2C precursor to obtain fluoride-free Mo2C MXene, and avoid the use of toxic and highly corrosive acids. The resulting MXene exhibits a unique 2D graphene-like structure and high purity. When used as a negative electrode material for rechargeable batteries, Mxene shows excellent rate performance and cycle stability. The storage capacity of lithium can be stabilized at about 150 mAh g-1, and the storage capacity of sodium can be stabilized at about 50 mAh g-1. In addition, the flexible Mo2cmXene-based batteries have excellent capacity retention rates (89% and 74%). Therefore, this MXene shows great potential in ion storage applications, and this green synthesis method can extend the synthesis ideas of other MXenes, which is of great reference significance.

Application fields: energy storage, catalysis, analytical chemistry, mechanics, adsorption, biology, microelectronics, sensors, etc

The size and process can be customized