English
The growth of two-dimensional (2D) materials through chemical vapor deposition (CVD) has attracted increasing interest from both the industrial and academic communities. People's interest stems from several key advantages related to CVD, including high yield, high quality, and high adjustability. In order to unleash the application potential of two-dimensional materials, it is usually necessary to transfer them from the growth substrate to the desired target substrate. However, traditional transfer methods can introduce pollution, which can have adverse effects on the quality and performance of the transferred 2D materials, thereby limiting their overall application performance. This review comprehensively summarizes the current clean transfer methods for 2D materials, with a particular focus on understanding the interaction between the support layer and 2D materials. The review covers various aspects, including clean transfer methods, post transfer cleaning techniques, and cleanliness assessment. In addition, it also analyzed and compared the advantages and limitations of these clean transfer technologies. Finally, the review emphasized the main challenges related to current clean transfer methods and provided prospects for the future.
